Titanium disilicide

Titanium disilicide[1]
Names
	IUPAC name Titanium disilicide
	Other names Titanium silicide
Identifiers
CAS Number	12039-83-7 ;
3D model (JSmol)	Interactive image;
ECHA InfoCard	100.031.719
EC Number	234-904-3;
PubChem CID	6336889;
CompTox Dashboard (EPA)	DTXSID70894998 ;
	InChI InChI=1S/2Si.Ti Key: DFJQEGUNXWZVAH-UHFFFAOYSA-N;
	SMILES [Si]=[Ti]=[Si];
Properties
Chemical formula	TiSi2
Molar mass	104.038 g/mol
Appearance	black orthorhombic crystals
Density	4.02 g/cm3
Melting point	1,470 °C (2,680 °F; 1,740 K)
Solubility in water	insoluble
Solubility	soluble in HF
Hazards
GHS pictograms
GHS Signal word	Warning
GHS hazard statements	H228, H315, H319, H335
GHS precautionary statements	P210, P240, P241, P261, P264, P271, P280, P302+352, P304+340, P305+351+338, P312, P321, P332+313, P337+313, P362, P370+378, P403+233, P405, P501
Related compounds
Other cations	Zirconium disilicide; Hafnium disilicide
	Except where otherwise noted, data are given for materials in their standard state (at 25 °C [77 °F], 100 kPa).
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	Infobox references

Titanium disilicide (Ti Si₂) is an inorganic chemical compound.

Titanium silicide is used in the semiconductor industry. It is typically grown by means of salicide technology over silicon and polysilicon lines to reduce the sheet resistance of local transistors connections. In the microelectronic industry it is typically used in the C54 phase.

References

Lide, David R. (1998), Handbook of Chemistry and Physics (87 ed.), Boca Raton, Florida: CRC Press, pp. 4–91, ISBN 0-8493-0594-2

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[hand-1] Lide, David R. (1998), Handbook of Chemistry and Physics (87 ed.), Boca Raton, Florida: CRC Press, pp. 4–91, ISBN 0-8493-0594-2