Mask inspection

In microtechnology, mask inspection or photomask inspection is an operation of checking the correctness of the fabricated photomasks, used, e.g., for semiconductor device fabrication.[1]

Modern technologies for locating defects in photomasks are automated systems that involve scanning electron microscopy and other advanced tools.[2]

Mask data inspection

The term "mask inspection" may also informally refer to mask data inspection step performed before actual writing the real mask.[3] Other methods of inspection use specially constructed light microscope systems such as are available from Probing Solutions Inc. These rely on white light, typically optimized at approximately 538 nM and use incident bright and dark field as well as transmitted bright and dark field illumination to see pin holes, edge defects and many forms of contamination and substrate defects.

gollark: But even though they could probably share some code and stuff, they're separate, hard to find, randomly scattered across the internet, and don't integrate well.
gollark: CC has lots of crypto libraries for various primitives: SHA256, "Ring LWE" for some reason, elliptic curve cryptography, SHA1, AES, ChaCha20.
gollark: Oh, the `/` operator thing was completely intended as an ugly hack, it was kind of a parody of Alex's Hell Superset.
gollark: Another idea I had was a general-purpose crypto library with sane defaults.
gollark: PotatOS contains a nice and general string split function for `/` operator support which I stole from the lua users wiki, but it's somewhat annoying.

References

  1. "VLSI technology: fundamentals and applications", by Yasuo Tarui, 1986, ISBN 3-540-12558-2, Chapter 4: "Mask Inspection Technology"
  2. ZEISS Webpage offering automated mask repair tools
  3. "Design for manufacturability and yield for nano-scale CMOS", by Charles Chiang, Jamil Kawa, 2007, ISBN 1-4020-5187-5, p. 237


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