Remote plasma
A remote plasma (also downstream plasma or afterglow plasma) is a plasma processing method in which the plasma and material interaction occurs at a location remote from the plasma in the plasma afterglow.[1][2]
Remote plasma system.
See also
- Chemical vapor deposition
- Corona treatment
- List of plasma (physics) applications articles
- Physical vapor deposition
- Plasma activation
- Plasma chemistry
- Plasma cleaning
- Plasma-activated bonding
- Reactive ion etching
References
- Tommi Kääriäinen; David Cameron; Marja-Leena Kääriäinen; Arthur Sherman (17 May 2013). Atomic Layer Deposition: Principles, Characteristics, and Nanotechnology Applications. Wiley. pp. 21–. ISBN 978-1-118-74742-1.
- Alexander Fridman (5 May 2008). Plasma Chemistry. Cambridge University Press. pp. 532–. ISBN 978-1-139-47173-2.
This article is issued from Wikipedia. The text is licensed under Creative Commons - Attribution - Sharealike. Additional terms may apply for the media files.